发明名称 |
Methods and compositions for removal of anti-reflective layers using fluorine containing compounds, oxidants, and water |
摘要 |
Methods for the removal of anti-reflective layers during fabrication of integrated circuits are disclosed. In particular, an anti-reflective pattern or layer can be removed using a solution that includes a fluorine containing compound, an oxidant, and water. The fluorine containing compound in the solution can be hydrogen fluorine containing compound. Preferably, the oxidant in the solution is H2O2. The oxidant in the solution can also be ozone water. Related compositions are also disclosed.
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申请公布号 |
US6562727(B2) |
申请公布日期 |
2003.05.13 |
申请号 |
US20000750955 |
申请日期 |
2000.12.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YEO IN-JUN;YOON BYOUNG-MOON |
分类号 |
H01L21/027;C09K13/00;H01L21/311;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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