| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for making automatic setting for a liquid-treating apparatus for automatically controlling a supply-amount adjuster and a treating-liquid sucker so that a treating-liquid supply means can uniformly supply the treating liquid to a to-be-treated object. SOLUTION: An amount to be supplied by a regist nozzle 110 is detected by an electronic force balance 200, and the condition of regist liquid in a supply part 113 of the nozzle 110 is detected by a CCD camera 300. An opening/closing valve AV and a suck valve SV are regulated on the basis of detection signals of the electronic force balance 200 and the camera 300, and information which has been recorded beforehand on a CPU 100, and includes at least characteristic of the regist liquid and piping conditions, so that the regist nozzle can uniformly supply the regist liquid on the wafer W. |
