发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT APPARATUS
摘要 PURPOSE: To prevent ionized amine from flowing into ultra pure water in a process for producing the ultra pure water used for a manufacturing process of a semiconductor integrated circuit apparatus. CONSTITUTION: A plurality of capillary tube-line hollow fiber membranes TYM are formed of a polysulfone film, and a polyimide film or the like are arranged in a case KOT, both end sections of the plurality of hollow fiber membranes are bonded by thermal solvent welding. Further, a UF module that is composed by also bonding the hollow fiber membrane TYM to the base by the thermal solvent welding is arranged in a UF apparatus, and such a UF apparatus is arranged in an ultra pure manufacturing system.
申请公布号 KR20030035994(A) 申请公布日期 2003.05.09
申请号 KR20020066073 申请日期 2002.10.29
申请人 发明人
分类号 H01L21/8247;C02F9/00;H01L21/304;H01L21/306;H01L21/8234;H01L27/10;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/304 主分类号 H01L21/8247
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