| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method comprising an exposure correction method for correcting variations in dimensions caused by a density difference of a pattern which occurs during processing in addition to a proximity effect correction and fogging exposure correction. SOLUTION: The method relates to the exposure and transfer of a transfer pattern to an object to be transferred by an electron beam drawing apparatus. In correcting dimensional errors of a transfer pattern caused by a density difference of an original transfer pattern, when adopting a correction method of modulating the exposure of a drawing by an area ratio, the method has a step of setting a first area ratioα1 of a transferring pattern which targets a small area of a mask area and a second area ratioα2 of a transferring pattern which targets an area larger than the mask area targeted by the first area ratio to each correction cell, a step of setting one modulation parameter to each of various combinations of the first area ratio and the second area ratio based on a predetermined relationship, and a step of acquiring basic exposure×modulation parameter = correction exposure to define the acquired exposure as drawing exposure.</p> |
