发明名称 |
METHOD AND DEVICE FOR FORMING FILM PATTERN, CONDUCTIVE FILM WIRING, ELECTRO-OPTICAL DEVICE, ELECTRONIC EQUIPMENT, AND NON-CONTACT CARD MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a film pattern forming method obtained by improving a film pattern forming method using an injection method and capable of efficient ly thickening a film by a simple process, satisfying the requirement for thinning, and preventing the occurrence of problems such as disconnection and a short circuit in the case of forming a conductive film. SOLUTION: In a 1st discharge process, liquid drops are discharged at a pitch larger than the diameter of a liquid drop after applying liquid drops to the whole wiring area of a board. In a 2nd discharge process, liquid drops are discharged to a position different from the discharge position of the 1st discharge process on the whole wiring forming area at the same pitch as the 1st discharge process. In a 3rd discharge process, liquid drops are discharged to the whole wiring forming area at a pitch smaller than the pitch of the 1st discharge process. The board is previously treated so that a contact angle with a liquid drop is >=60 [deg].
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申请公布号 |
JP2003133691(A) |
申请公布日期 |
2003.05.09 |
申请号 |
JP20010323701 |
申请日期 |
2001.10.22 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HASHIMOTO TAKASHI;FURUSAWA MASAHIRO |
分类号 |
B41J2/01;B41J3/407;H01L21/288;H01L21/768;H05K3/10;H05K3/12;(IPC1-7):H05K3/10 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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