发明名称 METHOD AND DEVICE FOR FORMING FILM PATTERN, CONDUCTIVE FILM WIRING, ELECTRO-OPTICAL DEVICE, ELECTRONIC EQUIPMENT, AND NON-CONTACT CARD MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a film pattern forming method obtained by improving a film pattern forming method using an injection method and capable of efficient ly thickening a film by a simple process, satisfying the requirement for thinning, and preventing the occurrence of problems such as disconnection and a short circuit in the case of forming a conductive film. SOLUTION: In a 1st discharge process, liquid drops are discharged at a pitch larger than the diameter of a liquid drop after applying liquid drops to the whole wiring area of a board. In a 2nd discharge process, liquid drops are discharged to a position different from the discharge position of the 1st discharge process on the whole wiring forming area at the same pitch as the 1st discharge process. In a 3rd discharge process, liquid drops are discharged to the whole wiring forming area at a pitch smaller than the pitch of the 1st discharge process. The board is previously treated so that a contact angle with a liquid drop is >=60 [deg].
申请公布号 JP2003133691(A) 申请公布日期 2003.05.09
申请号 JP20010323701 申请日期 2001.10.22
申请人 SEIKO EPSON CORP 发明人 HASHIMOTO TAKASHI;FURUSAWA MASAHIRO
分类号 B41J2/01;B41J3/407;H01L21/288;H01L21/768;H05K3/10;H05K3/12;(IPC1-7):H05K3/10 主分类号 B41J2/01
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