| 摘要 |
PURPOSE: A method for manufacturing a liquid crystal display device is provided to selectively form a reflective layer without progressing a photo lithography, thereby reducing the number of processes and the material cost, and improving the productivity. CONSTITUTION: A plurality of thin film transistors are formed on a substrate. First, second, and third passivation layers(21,22,23) are deposited on the thin film transistors and a whole pixel area. A reflective layer(20) is selectively deposited on the third passivation layer by using a shadow mask(60) at only wanted parts to expose an align key(40). An insulating layer is deposited on a whole surface of the reflective layer. The insulating layer is patterned and has contact holes to partially expose drain electrodes of the thin film transistors. Pixel electrodes are deposited by sputtering.
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