METHOD AND FEEDSTOCK FOR MANUFACTURING PHOTOMASK MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a quartz glass which can be manufactured without producing harmful gas and which has high transmittance at 157 nm wavelength. SOLUTION: The method for manufacturing a photomask material includes processes of producing plasma delivering powder containing silicon dioxide to the plasma to produce silica particles and depositing the silica particles on the deposition face to form the quartz glass.