| 摘要 |
PROBLEM TO BE SOLVED: To provide an adaptor, an adaptor holder, a plasma treatment apparatus, etc., that can improve the removing efficiency of by-products existing in a chamber, when the inside of the chamber is dry-cleaned. SOLUTION: A dome 5, constituting the chamber 50 of a CVD system, is provided with a gas inlet port 8b through which a film-forming gas, such as SiH4 , is introduced into the chamber 50. At the circumference of the port 8b, in addition, a disk-like adaptor 9 is held by means of an adaptor holder 90 screwed on a nozzle 8, so that the adaptor 9 faces the internal surface of the dome 5 and will not be coupled with the nozzle 8. Consequently, a space which serves as a heat insulating layer is formed between the adaptor 9 and the dome 5, and at the same time, the heat conduction from the adaptor 9 via the nozzle 8 is suppressed. Therefore, the temperature drop of the adaptor 9 is suppressed, and at the same time, the thermal fatigue of the adaptor 9 is reduced, after the adaptor 9 has been warmed once.
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