| 摘要 |
PROBLEM TO BE SOLVED: To provide an illuminator suitable for manufacturing a semiconductor device which can illuminate the surface being irradiated uniformly while utilizing an illumination luminous flux effectively and an projection aligner using the same. SOLUTION: The illuminator comprises a diffraction optical element forming a light pattern having a desired illuminance distribution on a predetermined plane by using the luminous flux from a light source, and a focus optical system for projecting the light pattern formed on the plane on a prescribed plane wherein the image formation optical system has a variable magnification.
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