METHOD FOR PRODUCING SILVER-SILVER CHLORIDE ELECTRODE

摘要

PURPOSE: Provided is a method for producing a silver-silver chloride electrode having fine structure by reacting a plasma state of chlorine gas with silver, which can simply mass-producing the electrode. CONSTITUTION: The method comprises the steps of (i) vapor-depositing silver with predetermined thickness on an insulating substrate(101), to form a thin film layer of silver(102), and (ii) reacting the thin film layer with chlorine plasma to form silver chloride layer(103). The thickness of the thin film layer of silver(102) is 4000-6000 angstrom. The chlorine plasma is formed at the condition of RF(Radio Frequency) of 80-120 mW, the flow rate of chlorine gas of 50-150 sccm, and the chamber pressure of 80-120 mTorr.