| 摘要 |
PURPOSE: A wet etching apparatus is provided to efficiently use an installation space of the wet etching apparatus and realize etching uniformity of an object to be etched by spraying an etching solution with rotating the object to be etched. CONSTITUTION: A loader/unloader part(210) loads and unloads an object to be etched. An etching process part(220) performs an etching process, a rinsing process, and a drying process in a single space. The etching process part includes an etching solution supplying part(223) spraying an etching solution, a deionized water supplying part(221) spraying deionized water, a gas supply part(222) spraying gas. A rotating part(224) of the etching process part rotates the loaded objected. A water supply control valve(250) controls water supply directions of the etching solution and the deionized water discharged from the etching process part to recycle the etching solution.
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