| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic substrate for semiconductor production and inspection, which can satisfy various characteristics required for the respective parts of the inside of a ceramic substrate, sintering properties, concealing properties, thermal conductivity, volume resistivity, or the like, and also demonstrate functions demanded as a wafer probe, an electrostatic chuck, etc. SOLUTION: A ceramic substrate for semiconductor manufacturing and inspection apparatus for heating a semiconductor wafer putting the semiconductor wafer, in contact with the ceramic board or with a constant interval, contains carbon and a resistor heating element is formed as a conductive body in the inside of the ceramic board. The carbon concentration in the ceramic layer between resistor heating elements is lower than that in other portions. |
