发明名称 METHOD FOR CLEANING SURFACE OF POLLUTED BASIC MATERIAL WITH PORE
摘要 PURPOSE: A method for cleaning the surface of a polluted basic material with pores is provided to effectively remove pollutants from the basic material without the damage of the basic material. CONSTITUTION: A method for cleaning the surface of a polluted basic material with pores comprises the steps of: deciding an energy wavelength according to coating and basic materials, and pollutants(S100); and injecting laser having the decided energy wavelength into the basic material(S200) and removing the pollutants on the basic material with pores(S300,400).
申请公布号 KR20030035239(A) 申请公布日期 2003.05.09
申请号 KR20010067219 申请日期 2001.10.30
申请人 KOMICO LTD. 发明人 CHOI, JIN SIK
分类号 B08B7/00;B01J19/12;B08B3/12;C23G5/00;(IPC1-7):B08B3/12 主分类号 B08B7/00
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