| 摘要 |
A fine particulate polishing agent comprises fine particles of a solid solution composed of single-crystal ceric oxide and silicon dioxide and fine particles of silicon dioxide. A slurry polishing agent comprising the fine particulate polishing agent can be prepared by a method which comprises the steps of mixing, with stirring, single-crystal ceric oxide fine particles, silica sol and a liquid; drying the mixture; subjecting the dried particulate material to a thermal treatment at a high temperature, and then cooling the solid solution powder formed by the thermal treatment and composed of single crystal ceric oxide and silicon dioxide; again mixing the powder with silica sol and a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry.
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