| 摘要 |
PURPOSE: An acryl-based monomer and its polymer for the preparation of negative photoresist, and a photoresist composition and a fluorescent layer composition containing the polymer are provided, to improve the sensitivity, the resolution and the storage stability. CONSTITUTION: The acryl-based monomer has an azide group and is represented by the formula 1, wherein R1 is H or CH3; and R2 is a functional group I or II (wherein m and m' are 0-6, and M and M' are an element capable of being converted into a cation in an aqueous solution). The polymer comprises the monomer of the formula 1. Optionally the polymer is a copolymer of the monomer of the formula 1 and a monomer having a hydroxy group or an amine group, or a terpolymer of the monomer of the formula 1, a monomer having a hydroxy group and a monomer having an amine group. The fluorescent layer composition comprises the polymer and a fluorescent substance. |
