发明名称 LIQUID DROP DISCHARGE HEAD, WIPING METHOD THEREFOR AND ELECTRONIC DEVICE WITH THE SAME, METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE, METHOD FOR MANUFACTURING ORGANIC EL DEVICE, METHOD FOR MANUFACTURING ELECTRON EMITTING DEVICE, METHOD FOR MANUFACTURING PDP DEVICE, METHOD FOR MANUFACTURING ELECTROPHORETIC DISPLAY DEVICE, METHOD FOR MANUFACTURING COLOR FILTER, METHOD FOR MANUFACTURING ORGANIC EL, SPACER FORMATION METHOD, METAL WIRING FORMATION METHOD, LENS FORMATION METHOD, RESIST FORMATION METHOD AND LIGHT DIFFUSE BODY FORMATION METHOD
摘要 PURPOSE: To provide a liquid drop discharge head which can be effectively prevented from being caught by or choked with a wiping member, a wiping method therefor and an electronic device with the same. CONSTITUTION: There are provided a liquid introduction part 45, a pump part 48 continuous with the liquid introduction par 45, and a nozzle formation plate 49 set overlapping with the pump part 48 and having nozzle openings 63 formed. The nozzle formation plate 49 is formed to be nearly square seen from the liquid drop discharge side. A resin 62 is molded to at least one of side face parts along at least a long side direction of the nozzle formation plate 49.
申请公布号 KR20030035892(A) 申请公布日期 2003.05.09
申请号 KR20020061971 申请日期 2002.10.11
申请人 SEIKO EPSON CORPORATION 发明人 NAKAMURA SHINICHI;YAMADA YOSHIAKI
分类号 B41J2/01;B41J2/14;B41J2/165;G02B5/20;G02F1/1335;G02F1/1339;H01J9/227;H01J9/24;H01J11/22;H01J11/34;H01J11/42;H01L51/50;H05B33/10;(IPC1-7):B41J2/00 主分类号 B41J2/01
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