| 摘要 |
PURPOSE: An imaging apparatus, a preparation method of a device and a device prepared by the method are provided, to improve remarkably the throughput of the imaging apparatus used to make an integrated circuit or other semiconductor devices. CONSTITUTION: The imaging apparatus(30) comprises a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning means which patterns the projection beam according to a desired pattern and can be programmed; a substrate table for holding a substrate; and a projection system(PL) for projecting the patterned beam onto a target portion of the substrate, wherein the patterning means comprises a plurality of separate patterning sub-elements which are used to generate a patterned sub-beam, and the apparatus comprises a combining means(CM) for combining the plurality of patterned sub-beams into a single patterned image. Preferably the combining means comprises a beam splitter.
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