| 摘要 |
PROBLEM TO BE SOLVED: To provide a shower plate which has excellent resistance to attack by corrosive gases and their plasmas, high strength, and high workability. SOLUTION: The shower plate for a semiconductor manufacturing apparatus, with which the corrosive gas are supplied to a wafer surface through a plurality of pores and ejection openings formed at tips of the pores, is made of ceramic having a main crystal phase of a compound of alumina and YAG (yttrium aluminum garnet). |
