发明名称 INTERNAL SUPPLY VOLTAGE GENERATION CIRCUIT USED FOR HIGH-SPEED SEMICONDUCTOR DEVICE AND METHOD FOR GENERATING INTERNAL SUPPLY VOLTAGE THEREOF
摘要 PURPOSE: An internal supply voltage generation circuit used for a high-speed semiconductor device and a method for generating an internal supply voltage thereof are provided to enhance an operating speed by preventing the internal supply voltage drop in a low voltage region. CONSTITUTION: A comparison circuit is formed with PMOS transistors(P1,P2) and NMOS transistors(N1,N2,N3) in order to compare a reference voltage and an output voltage(PIVC). A level compensation portion(P3) boosts an output voltage level from a reference voltage level to an external supply voltage level in response to a compared level of the comparison circuit. A drop prevention portion(P4) receives the external supply voltage and prevents the output voltage drop in response to a detection signal of a supply voltage region. The drop prevention portion(P4) is operated independently of the comparison circuit and the level compensation portion(P3) by the external supply voltage.
申请公布号 KR20030035311(A) 申请公布日期 2003.05.09
申请号 KR20010067327 申请日期 2001.10.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JIN GUK
分类号 G11C5/14;(IPC1-7):G11C5/14 主分类号 G11C5/14
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