发明名称 |
INTERNAL SUPPLY VOLTAGE GENERATION CIRCUIT USED FOR HIGH-SPEED SEMICONDUCTOR DEVICE AND METHOD FOR GENERATING INTERNAL SUPPLY VOLTAGE THEREOF |
摘要 |
PURPOSE: An internal supply voltage generation circuit used for a high-speed semiconductor device and a method for generating an internal supply voltage thereof are provided to enhance an operating speed by preventing the internal supply voltage drop in a low voltage region. CONSTITUTION: A comparison circuit is formed with PMOS transistors(P1,P2) and NMOS transistors(N1,N2,N3) in order to compare a reference voltage and an output voltage(PIVC). A level compensation portion(P3) boosts an output voltage level from a reference voltage level to an external supply voltage level in response to a compared level of the comparison circuit. A drop prevention portion(P4) receives the external supply voltage and prevents the output voltage drop in response to a detection signal of a supply voltage region. The drop prevention portion(P4) is operated independently of the comparison circuit and the level compensation portion(P3) by the external supply voltage.
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申请公布号 |
KR20030035311(A) |
申请公布日期 |
2003.05.09 |
申请号 |
KR20010067327 |
申请日期 |
2001.10.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, JIN GUK |
分类号 |
G11C5/14;(IPC1-7):G11C5/14 |
主分类号 |
G11C5/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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