| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive resist composition capable of providing a resist which improves shrinkage of a pattern in observation with SEM (scanning electron microscope) while retaining excellent dry etching resistance and does not require removal of metal. SOLUTION: [1]: In the positive resist composition comprising a resin which is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of an acid and an acid generator, the resin has a polymerized unit of formula (I). [2]: In the positive resist composition [1], the amounts of the resin and the acid generator are 80-99.9 wt.% and 20-0.1 wt.%, respectively, based on the total weight of the resin and the acid generator. |
