发明名称 PROCESS FOR FORMING THIN FILM OF TRIAZINE THIOL DERIVATIVE
摘要 PROBLEM TO BE SOLVED: To improve the durability of a thin film while easily forming the thin film and retaining the functionality of the thin film surface. SOLUTION: A process for forming the thin film of a triazine thiol derivative on a solid surface via vapor deposition comprises a vapor deposition step and a photopolymerization step. In the vapor deposition step, at least one triazine thiol derivative is vacuum deposited on the solid surface to form a laminated thin film. In the photopolymerization step, the solid on which the laminated thin film has been formed is exposed to light to polymerize the triazine thiol derivative. In the vapor deposition step, a magnetic field is applied to the solid.
申请公布号 JP2003129220(A) 申请公布日期 2003.05.08
申请号 JP20010329030 申请日期 2001.10.26
申请人 JAPAN SCIENCE & TECHNOLOGY CORP;IWATE PREFECTURE 发明人 MORI KUNIO;SUZUKI KAZUTAKA;BABA MAMORU
分类号 C08J5/18;C03C17/28;C08G85/00;C09K3/00;C23C14/12;C23C14/24;C23C14/58;(IPC1-7):C23C14/12 主分类号 C08J5/18
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