发明名称 |
THIN FILM FORMER |
摘要 |
PROBLEM TO BE SOLVED: To form a thin film in the state in which damages due to dust and abnormal plasma are suppressed. SOLUTION: A plasma confinement cylinder 113 that confines the scatter region of the ECR plasma delivered from a plasma formation chamber 102 is provided below the bottom of a target 105 (container 105a). The cylinder is made from a nonmagnetic material such as quartz or alumina. The cylinder 113 confines the scattering of a plasma stream delivered from the chamber 102 and passed through the region of the target 105 and confines the irradiation region of the plasma stream in the surface defined by the surface of a sample mount 104 within the region on the sample mount 104.
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申请公布号 |
JP2003129236(A) |
申请公布日期 |
2003.05.08 |
申请号 |
JP20010326061 |
申请日期 |
2001.10.24 |
申请人 |
NIPPON TELEGR & TELEPH CORP;NTT AFTY CORP |
发明人 |
JIN YOSHITO;ONO TOSHIRO;SHIMADA MASARU;MATSUO SEITARO |
分类号 |
G02B5/28;C23C14/35;H01L21/31;(IPC1-7):C23C14/35 |
主分类号 |
G02B5/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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