发明名称 Memory cell for dynamic random access memories comprises trench filled with conductive material, selection transistor, and lateral insulation collar of trench
摘要 A memory cell (400) comprises trench filled with conductive material; selection transistor; connection (6) connecting the conductive material to selection transistor, the connection including vertical insulation collar; and lateral insulation collar of trench (5). The vertical insulation collar is connected to lateral insulation collar. The lateral insulation collar is configured laterally with respect to vertical insulation collar. Independent claims are also included for: (a) a semiconductor component with at least one memory cell, comprising a trench filler with a conductive material; a selection transistor; a connection; and a lateral insulation collar; and (b) manufacture of lateral insulation collar for a memory cell, comprising fabricating a bottle trench and filling the trench near the vertical wall; subsequently filling an upper, curved region of the trench with an insulator; and anisotropically etching the upper region of the trench to penetrate through the insulator.
申请公布号 DE10153110(A1) 申请公布日期 2003.05.08
申请号 DE20011053110 申请日期 2001.10.22
申请人 INFINEON TECHNOLOGIES AG 发明人 HIERLEMANN, MATTHIAS;STRASSER, RUDOLF
分类号 H01L21/334;H01L21/8242;H01L27/108;H01L29/76;H01L29/94;H01L31/119;(IPC1-7):H01L27/108 主分类号 H01L21/334
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