METHOD FOR PRODUCING RESIST MONOMER OF DECREASED CONTENT OF LEAD COMPONENT

摘要

PROBLEM TO BE SOLVED: To provide a method for easily and surely removing impurities (lead components) to be considered to be lead or a kind of organic lead compound that are contained in a resist for semiconductor and a resist monomer for its raw material, and can not be removed by distillation or washing by a general acid. SOLUTION: The above lead components are removed by bringing a crude resist monomer ((meth)acrylate monomer or the like having an adamantane skeleton) that contains these lead components as impurities into contact with chlorine (Cl2 ), bromine (Br2 ) or iodine (I2 ) (washing by an aqueous solution thereof or the like). Excess chlorine, bromine or iodine can be removed by reducing with a reducing agent such as sodium thiosulfate. This method enables production of the resist monomer of highly reduced various impurities such as lead components.