发明名称 |
PLATING APPARATUS AND PLATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To facilitate the formation of a more homogeneous plating film on the surface to be plated of a material to be treated. SOLUTION: The plating apparatus has a holding section 12 which holds an upwardly turned material W by sealing the outer edge of the surface to be plated, a heating-fluid holding section 40 which holds a heating fluid which is brought into contact with the material W held by the holding section 12 to heat the material W, and a plating liquid supply section 62 which supplies a plating liquid 60 to the surface to be treated of the material W held by the holding section 12.
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申请公布号 |
JP2003129250(A) |
申请公布日期 |
2003.05.08 |
申请号 |
JP20010319837 |
申请日期 |
2001.10.17 |
申请人 |
EBARA CORP |
发明人 |
HONGO AKIHISA;O CHIKAAKI;MATSUDA NAOKI |
分类号 |
C23C18/31;H01L21/288;H01L21/768;(IPC1-7):C23C18/31 |
主分类号 |
C23C18/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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