发明名称 PLATING APPARATUS AND PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To facilitate the formation of a more homogeneous plating film on the surface to be plated of a material to be treated. SOLUTION: The plating apparatus has a holding section 12 which holds an upwardly turned material W by sealing the outer edge of the surface to be plated, a heating-fluid holding section 40 which holds a heating fluid which is brought into contact with the material W held by the holding section 12 to heat the material W, and a plating liquid supply section 62 which supplies a plating liquid 60 to the surface to be treated of the material W held by the holding section 12.
申请公布号 JP2003129250(A) 申请公布日期 2003.05.08
申请号 JP20010319837 申请日期 2001.10.17
申请人 EBARA CORP 发明人 HONGO AKIHISA;O CHIKAAKI;MATSUDA NAOKI
分类号 C23C18/31;H01L21/288;H01L21/768;(IPC1-7):C23C18/31 主分类号 C23C18/31
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