| 摘要 |
PROBLEM TO BE SOLVED: To provide an effective vacuum treatment method wherein the ratio among the electric powers of a plurality of high-frequency electric powers used in vacuum treatment can be effectively determined, and the ratio among electric powers in the case in which the same treatment is performed by using another apparatus structure can be suitably and effectively determined. SOLUTION: First, the luminous intensity of the plasma generated in a reactor 101 when a first high-frequency electric power from a high-frequency wave electric source 105a is applied alone and the luminous intensity of the plasma generated in the reactor 101 when a second high-frequency electric power from a high-frequency electric power source 105b is applied alone are previously determined. Then, the ratio of the output electric powers of the first and second high-frequency electric powers is determined so that the ratio between the luminous intensities of the plasmas may fall within a specified range, and a substrate 102 is subjected to vacuum treatment in the determined output power ratio. |
