RUTHENIUM COMPLEX, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING THIN FILM

摘要

A ruthenium-containing thin film is produced by the chemical vapor deposition method etc. with the use of an organometallic ruthenium compound represented by the general formula (1), specific example of which is (2,4-dimethyl-pentadienyl)(ethylcyclopentadienyl) ruthenium: or an organometallic ruthenium compound represented by the general formula (7), specific example of which is carbonylbis(2-methyl-1,3-pentadiene) ruthenium: as the precursor.