发明名称 Photosensitive resin composition
摘要 A photosensitive resin composition according to the invention includes (A) a photosensitive resin, (B) an epoxy resin, (C) a photopolymerization initiator, and (D) a polymerizable unsaturated compound and/or a solvent, which photosensitive resin (A) is obtained by allowing an epoxy resin (a) to react with a compound (b) having one primary alcoholic hydroxyl group and one functional group selected from a carboxyl group and a secondary amino group per molecule and an unsaturated monobasic acid (c) to yield a reaction product (I) and allowing a saturated or unsaturated polybasic acid anhydride (d) to react with the reaction product (I). The photosensitive resin composition of the invention is used as a solder resist in printed circuit boards, can be satisfactorily developed in a dilute basic aqueous solution and can yield a cured film that is excellent in flexibility, water resistance, adhesion, solder heat resistance, electroless gold plating resistance and pressure cooker test (PCT) resistance.
申请公布号 US2003087189(A1) 申请公布日期 2003.05.08
申请号 US20020169927 申请日期 2002.07.11
申请人 TAKAGI TORU;YADA MITSUHIRO;SAITOU TAKESHI 发明人 TAKAGI TORU;YADA MITSUHIRO;SAITOU TAKESHI
分类号 C08G59/56;G03F7/038;H01L23/498;H05K3/28;(IPC1-7):G03F7/027;C08G59/14 主分类号 C08G59/56
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