SILICON SUBSTRATE SELECTION METHOD, INK JET HEAD, INK JET HEAD MANUFACTURING METHOD, AND INK JET RECORDING DEVICE, ITS MANUFACTURING METHOD, INK JET RECORDING METHOD, COLOR FILTER MANUFACTURING DEVICE, ITS MANUFACTURING METHOD, COLOR FILTER MANUFACTURING METHOD, AND ELECTROLUMINESCENT SUBSTRATE MANUFACTURING DEVICE, ITS MANUFACTURING METHOD, AND ELECTROLUMINESCENT SUBSTRATE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To show a selection criterion of a silicon mono crystal substrate material quantitatively so as to form the size of a member evenly at etching, and to obtain an ink jet head using a silicon mono crystal substrate and a recoding device such as a printer using the head. SOLUTION: The recording device is equipped with at least: the ink jet head 112 manufactured by forming a member such as a discharge room 11 by using a substrate with oxygen concentration in Si substrate <=15×10<17> atoms/cm<3> ; a drum 111 which changes a relative position of print paper 110 and the line ink jet head 112; a motor 115 which revolves the drum 111 based on a roller control signal; and a print control means 116 to control discharging of ink from each nozzle of the ink jet head 112 and control the revolving by transmitting a motor 115 and roller control signal.