发明名称 SOI-Halbleiteranordnung mit veränderlichen Schwellwert-Spannungen
摘要 <p>In an SOI-type semiconductor device, a power supply voltage (VDD) is applied to back gates of P-channel MOS transistors in a standby mode, and a voltage lower than the power supply voltage is applied to the back gates of the P-channel MOS transistors in an active mode. A ground voltage (GND) is applied to back gates of N-channel MOS transistors in the standby mode, and a voltage higher than the ground voltage is applied to the back gates of the N-channel MOS transistors in an active mode. <IMAGE></p>
申请公布号 DE69627063(D1) 申请公布日期 2003.05.08
申请号 DE1996627063 申请日期 1996.01.26
申请人 NEC CORP., TOKIO/TOKYO 发明人 OKUMURA, KOICHIRO;KUROSAWA, SUSUMU
分类号 H01L27/04;G05F3/24;H01L21/02;H01L21/336;H01L21/822;H01L21/8238;H01L21/8242;H01L27/02;H01L27/092;H01L27/108;H01L27/12;H01L29/78;H01L29/786;H03K19/00;(IPC1-7):H01L27/02 主分类号 H01L27/04
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