| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical element which can reduce the effect of potential double refraction at a high NA, a manufacturing method thereof, an exposure system and a device manufacturing method. SOLUTION: An optical element as one aspect has an angle formed by a [0 0 1] axis concerning a crystal orientation of a cubic system crystal, and by an optical axis which is less than 10 deg. (favorably 0 deg.). |
