发明名称 SELECTIVE REFLECTION FILM AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a selective reflection film, by which a uniform hue with high color purity (in particular a green or a red hue) is obtained and color separation (patterning) is carried out with high accuracy without being affected by irradiation unevenness or the like in patterning. SOLUTION: The method for manufacturing the selective reflection film is characterized by making a liquid crystal composition containing a liquid crystal compound, a photo-reactive chiral compound with an isomerizing absorption band in a visible ray region and a polymerization initiator be irradiated with either circularly or elliptically polarized light with the direction identical to the helical twist direction of the liquid crystal so as to realize a picture and forming a pattern exhibiting the selective reflection corresponding to the irradiation. In a preferable manner, the photo-reactive chiral compound has the isomerizing absorption band in 490-570 nm or 630-690 nm and further the wavelength of the circularly or elliptically polarized light is 490-570 nm or 630-690 nm.
申请公布号 JP2003131187(A) 申请公布日期 2003.05.08
申请号 JP20010329452 申请日期 2001.10.26
申请人 FUJI PHOTO FILM CO LTD 发明人 ICHIHASHI MITSUYOSHI
分类号 G02B5/20;G02B5/30;G02F1/13;G02F1/1335 主分类号 G02B5/20
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