发明名称 MANUFACTURING METHOD OF MICROLENS SUBSTRATE, MICROLENS SUBSTRATE, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, ELECTRO-OPTICAL DEVICE AND PROJECTION TYPE DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of microlens substrate which can manufacture numerous microlens substrates from one large-sized substrate even when using a stepper, and which can form a microlens and a shielding membrane with a high position accuracy, a microlens substrate, a manufacturing method of electro-optical device, an electro-optical device and a projection type display device. SOLUTION: This is a manufacturing method of an opposed substrate (microlens substrate) 200 with a microlens to be used for a liquid crystal device 1. When forming a concave curved part 26 of a microlens 500 from an opening 61 of a mask material 60 by etching a first transparent substrate 20, an alignment mark 220 is formed beforehand at the lower layer side of the mask material 60. During the time of stepper exposure which is conducted after this, position matching of all the exposure mask is conducted using the alignment mask 220 as the standard. Therefore, a shielding film can be formed with a high position accuracy at the boundary territory of the microlens 500.
申请公布号 JP2003131012(A) 申请公布日期 2003.05.08
申请号 JP20010326923 申请日期 2001.10.24
申请人 SEIKO EPSON CORP 发明人 OZAWA NOBUHIKO
分类号 G03F7/004;G02B3/00;G02F1/1335;G03B21/00;G03F7/11;G03F7/40;H04N5/66 主分类号 G03F7/004
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