发明名称 |
Substrate processing system and substrate processing method |
摘要 |
The present invention provides a substrate processing system and method which can prevent the filter from being stuffed with foreign objects and make the filter accordingly more durable. The substrate processing system 12 comprising a substrate processing unit 46 for processing substrates W with a processing liquid, and a processing liquid recovery passage 75 for passing the processing liquid discharged from the substrate processing unit 46, in which the processing liquid recovery passage 75 includes a filter 80 for removing foreign objects mixed in the processing liquid, a cleaning fluid supply passage 120 for feeding a cleaning fluid for cleaning the filter 80, and a discharge passage 115 for discharging the processing liquid and the cleaning fluid from the filter 80.
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申请公布号 |
US2003084929(A1) |
申请公布日期 |
2003.05.08 |
申请号 |
US20020285410 |
申请日期 |
2002.11.01 |
申请人 |
KAMIKAWA YUJI;MUKAI EIICHI |
发明人 |
KAMIKAWA YUJI;MUKAI EIICHI |
分类号 |
H01L21/304;B08B3/02;H01L21/00;(IPC1-7):B08B3/04 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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