| 摘要 |
A host computer (8) transmits an exposure control instruction for exposure processing to a resist coating apparatus (1). The resist coating apparatus (1) performs pre-processing in accordance with the exposure control instruction transmitted from the host computer (8). Then, the resist coating apparatus (1) extracts parameters necessary for exposure processing from the received exposure control instruction and transmits them together with an exposure preparation start instruction to an exposure apparatus (2). The exposure apparatus (2) performs exposure processing on the basis of the received parameters, generates control data for controlling a development apparatus (5) on the basis of the processing result, and transmits this control data to the development apparatus (5).
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