METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD
摘要
According to the invention, a carbon hard mask layer (2) is applied to a substrate to be structured (1) by means of a plasma-enhanced deposition method in such a way that it has a diamond-like hardness in at least one vertical section of a layer. During the production of said diamond-type vertical section of a layer, the deposition parameters are adjusted in such a way that certain diamond-type growth regions are removed in situ by means of subsequent etching processes, and other diamond-type regions remain.
申请公布号
WO03038875(A2)
申请公布日期
2003.05.08
申请号
WO2002DE04034
申请日期
2002.10.29
申请人
INFINEON TECHNOLOGIES AG;CZECH, GUENTHER;FUELBER, CARSTEN;KIRCHHOFF, MARKUS;STEGEMANN, MAIK;VOGT, MIRKO;WEGE, STEPHAN
发明人
CZECH, GUENTHER;FUELBER, CARSTEN;KIRCHHOFF, MARKUS;STEGEMANN, MAIK;VOGT, MIRKO;WEGE, STEPHAN