发明名称 Pattern formation method using reflow enhancement layer and method for manufacturing reflective type liquid crystal display device using the same
摘要 Openings each having various opening area are formed in a photosensitive organic film by one-time exposure. A polyvinyl alcohol (PVA) film for increasing the thermal fluidity of the photosensitive organic film is coated on the photosensitive organic film, followed by a heat treatment to flow the polyvinyl alcohol film and the photosensitive organic film. After the heat treatment, the openings each having a small area are closed and smooth ruggedness of a surface of the photosensitive organic film results, and further the polyvinyl alcohol film is removed. Accordingly, a reflective electrode formed on the photosensitive organic film has ruggedness having a small average angle of inclination in its surface layer, and becomes thereby an ideal reflective electrode.
申请公布号 US6559917(B2) 申请公布日期 2003.05.06
申请号 US20010987088 申请日期 2001.11.13
申请人 NEC CORPORATION 发明人 IKENO HIDENORI
分类号 G02B1/11;G02F1/1335;G02F1/1343;G02F1/136;G02F1/1362;G02F1/1368;(IPC1-7):G02F1/133 主分类号 G02B1/11
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