发明名称 |
Method of manufacturing micromechanical surface structures by vapor-phase etching |
摘要 |
A method of sacrificial layer etching of micromechanical surface structures, in which a sacrificial layer is deposited on a heatable silicon substrate and is structured. A temperature difference between the substrate and the vapor phase of an etching medium is established in such a way that exposed metal contacts made of aluminum alloys are not attacked at the same time and are not subsequently exposed to any risk of corrosion.
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申请公布号 |
US6558559(B1) |
申请公布日期 |
2003.05.06 |
申请号 |
US19980019011 |
申请日期 |
1998.02.05 |
申请人 |
ROBERT BOSCH GMBH |
发明人 |
BECKER VOLKER;LAERMER FRANZ;OFFENBERG MICHAEL;SCHILP ANDREA |
分类号 |
B81C1/00;(IPC1-7):C23F1/00;C23F1/12;C23F1/14;C23F1/24 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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