发明名称 MONITORING STERILANT CONCENTRATION IN DIFFUSION-RESTRICTED REGIONS AS A BASIS FOR PARAMETRIC RELEASE
摘要 A method monitors a concentration of an oxidative gas or vapor in a diffusio n- restricted region in fluid communication with a sterilization chamber during a sterilization process. The method includes providing a concentration monitor responsive to the oxidative gas or vapor by generating a parameter corresponding to the concentration of the oxidative gas or vapor. The concentration monitor includes a temperature sensing device coupled to a chemical substance reactive with the oxidative gas or vapor to produce heat. The method further includes placing at least a portion of the concentration monitor comprising the chemical substance within the diffusion- restricted region. The method further includes introducing the oxidative gas or vapor into the sterilization chamber. The method further includes monitoring the parameter generated by the concentration monitor during the sterilization process. -37-
申请公布号 CA2411237(A1) 申请公布日期 2003.05.02
申请号 CA20022411237 申请日期 2002.11.04
申请人 ETHICON INC. 发明人 HUI, HENRY K.;ENGSTROM, KEITH;LIN, SZU-MIN;TIMM, DEBRA;FRYER, BEN;LEMUS, ANTHONY
分类号 G01N25/22;A61L2/20;A61L2/24;A61L2/26;A61L2/28;G01N25/28;G01N25/32;G01N31/22;(IPC1-7):A61L2/14 主分类号 G01N25/22
代理机构 代理人
主权项
地址
您可能感兴趣的专利