发明名称 DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING, AND MICROWAVE POWER SUPPLY DEVICE
摘要 <p>A microwave plasma processing device, comprising a processing container (12), a microwave generator (24), a wave guide tube (22) for guiding microwave from the microwave generator (24), and a microwave radiating member (19) for radiating the microwave having a wave length shortened by a wave-slowing plate (18) into a space inside the processing container, the wave guide tube (22) further comprising a single microwave output opening (22a) located at the position thereof corresponding to the center portion of the microwave radiating member (19).</p>
申请公布号 WO2003036700(P1) 申请公布日期 2003.05.01
申请号 JP2002010847 申请日期 2002.10.18
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