| 发明名称 |
Detergent composition |
| 摘要 |
A cleaning composition comprising (1) at least one of fluoride salts and hydrogendifluoride salts; (2) an organic solvent having a hetero atom or atoms; and (3) water; a method of cleaning metal gate, contact hole, via hole and capacitor using the composition; a method of cleaning a residual polymer derived from a resist using the composition; and a method of cleaning after CMP using the composition.
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| 申请公布号 |
US2003082912(A1) |
申请公布日期 |
2003.05.01 |
| 申请号 |
US20020257944 |
申请日期 |
2002.10.23 |
| 申请人 |
KEZUKA TAKEHIKO;ITANO MITSUSHI |
发明人 |
KEZUKA TAKEHIKO;ITANO MITSUSHI |
| 分类号 |
C11D3/02;C11D3/43;C11D7/10;C11D7/50;C11D11/00;G03F7/42;H01L21/306;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C11D3/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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