发明名称 SYSTEM AND DEVICE FOR PROCESSING SUPERCRITICAL AND SUBCRITICAL FLUID
摘要 <p>A system for processing supercritical and subcritical fluid capable of bringing the inside of at least one processing container 1 formed in a flow passage into a supercritical or subcritical high pressure field, wherein thermal operation is applied to process fluid to apply thermal expansion to the fluid to produce a pressure difference between the processing container 1 and the outside, whereby a specified temperature and the high pressure field suitable for the processing of the supercritical or subcritical fluid can be provided in the processing container 1.</p>
申请公布号 WO03035240(A1) 申请公布日期 2003.05.01
申请号 WO2002JP10509 申请日期 2002.10.09
申请人 TOHOKU TECHNO ARCH CO., LTD.;ARAI, KUNIO;INOMATA, HIROSHI;SMITH, RICHARD, LEE, JR. 发明人 ARAI, KUNIO;INOMATA, HIROSHI;SMITH, RICHARD, LEE, JR.
分类号 B01D9/02;B01D11/00;B01J3/00;B01J3/02;B01J3/04;B01J19/00;B01J19/24;(IPC1-7):B01J3/00;D06B19/00;B08B7/00;B01D9/00 主分类号 B01D9/02
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