METHOD OF FORMING FINE PATTERN

摘要

A method of forming a fine resist pattern which includes the step of forming on a substrate a photosensitive layer from a photosensitive composition comprising at least a compound which generates an acid upon irradiation with light and a fluoropolymer, wherein the fluoropolymer is represented by the formula 1: -M1-M2-A1- 1 wherein structural unit M1 is a structural unit which is derived from a fluoromonomer and in which any of the carbon atoms constituting part of the polymer main chain has at least one fluorine atom bonded thereto structural unit M2 is a structural unit comprising an aliphatic ring structure incorporated in the polymer main chain structural unit A1 is a structural unit derived from a monomer copolymerizable with the structural units M1 and M2 and the fluoropolymer has an acid-reactive substituent Y.