摘要 |
A quilting apparatus and method for guiding a sewing machine relative to at least one layer of fabric is disclosed in one presently preferred embodiment including an adjustable quilting frame and a carriage assembly configured to mountably support the sewing machine having an arbitrary throat depth. Preferably, the quilting frame is mounted relative to a working surface and supportably retains one or more fabric layers in a substantially planar orientation to accommodate the sewing and stitching of patterns and/or designs into at least a portion of the fabric layers forming the quilt. The carriage assembly may be configured to transport the sewing machine in both lateral and longitudinal directions with respect to the quilting frame. Preferably, the carriage assembly includes a lower carriage component disposed on a first track configured to transport the sewing machine along the longitudinal dimension of the quilting frame and an upper carriage component disposed on a second track relative to the upper surface of the lower carriage component and configured to transport the sewing machine along the lateral dimension of the quilting frame. The quilting frame includes support members acting as spools in relation to the fabric layers and having locking mechanisms associated therewith for maintaining a sufficient amount of tension in the body of the fabric layers. Preferably, the support members are configured having an adjustable length to accommodate various sizes and dimensions of the fabric layers forming the quilt and to accommodate the arbitrary dimensions of the working surface upon which the quilting frame is mounted. The height of the quilting frame may also be adjusted with respect to the working surface by means of a height adjustment assembly.
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