发明名称 Nonvolatile memory device and fabricating method thereof
摘要 A nonvolatile memory device includes two metal layers, which act respectively as a floating gate and a control gate, and each of which has a downwardly extended portion. Thereby, a surface area per fixed unit cell area is increased, or alternatively a unit cell area per fixed surface area is reduced. Therefore, the nonvolatile memory device has enhanced programming and erasing properties and also improved reliability. Furthermore, a method for forming the nonvolatile memory device is provided with simplified processes.
申请公布号 US2003080373(A1) 申请公布日期 2003.05.01
申请号 US20020278422 申请日期 2002.10.23
申请人 LEE DA SOON 发明人 LEE DA SOON
分类号 H01L27/115;H01L21/28;H01L21/336;H01L21/8247;H01L29/423;H01L29/788;(IPC1-7):H01L21/336 主分类号 H01L27/115
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