| 摘要 |
<p>A method of forming a film on an optical disk comprising (a) the step of carrying an optical disk substrate into a vacuum chamber, (b) the step of disposing the optical disk substrate to face a target provided in the vacuum chamber and including a film-forming material, and (c) the step of forming a specified film on a fixed or rotating-on-axis or revolving optical disk substrate by a sputtering method using the target, wherein a relation a > 2D is satisfied where a is a target radius and D the radius of the optical disk substrate, thereby forming a higher-density-compatible, homogeneous film on an optical disk.</p> |
