| 发明名称 |
IMPROVED PRECURSORS FOR CHEMICAL VAPOUR DEPOSITION |
| 摘要 |
Ti, Zr Hf and La precursors for use in MOCVD techniques have a ligand of the general formula OCR<1>(R<2>)CH2X, wherein R<1> is H or an alkyl group, R<2> is an optionally substituted alkyl group and X is selected from OR and NR2, wherein R is an alkyl group or a substituted alkyl group. |
| 申请公布号 |
WO03035926(A2) |
申请公布日期 |
2003.05.01 |
| 申请号 |
WO2002GB04822 |
申请日期 |
2002.10.25 |
| 申请人 |
EPICHEM LIMITED;JONES, ANTHONY, COPELAND |
发明人 |
JONES, ANTHONY, COPELAND |
| 分类号 |
C07C43/13;C07C41/26;C07F5/00;C07F7/00;C23C16/40;H01L21/316 |
主分类号 |
C07C43/13 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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