发明名称 MICROSCOPE APPARATUS TO INSPECT WAFER
摘要 PURPOSE: A microscope apparatus to inspect a wafer is provided to examine a wafer in various angles and positions by installing an angle and height adjusting part at a reflector. CONSTITUTION: An optical system having an objective lens(120) and an ocular eyepiece is installed at a body(100) of a microscope for examining a wafer(W). A sample pedestal(150) is located under the optical system for loading the wafer(W). A reflector(140) is installed under the lower portion of the objective lens(120) for reflecting a predetermined portion of the wafer(W) to the objective lens(120). An angle adjusting part is installed at one side of the reflector(140) for adjusting the reflection angle of the reflector(140). A height adjusting part is installed at the other side of the reflector(140) for adjusting the height of the reflector(140). Preferably, the angle adjusting part is provided with a frame(200) having two brackets and an angle adjusting lever. Preferably, the height adjusting part is provided with a guide(270), a rack(240) connected with the guide(270), a pinion(230) and a height adjusting lever for revolving the pinion(230).
申请公布号 KR20030033668(A) 申请公布日期 2003.05.01
申请号 KR20010065750 申请日期 2001.10.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JIN SEONG;KIM, SEOK HAN;OH, MYEONG HUN;WOO, JAE YEONG
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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