发明名称 SYSTEM FOR INVERTING SUBSTRATE
摘要 <p>The present invention is a substrate inverting apparatus (10) mounted to a substrate-coating machine (12). The apparatus (10) is used for inverting a substrate (14) within a vacuum chamber. The apparatus (10) includes a substrate holding means (16) for holding the substrate (14) substantially rigidly relative to the substrate holding means (16). The apparatus (10) further includes an actuating means (18) mounted to the substrate-coating machine (12) for inverting the subsrate holding means (16).</p>
申请公布号 WO03035277(A1) 申请公布日期 2003.05.01
申请号 WO2002US34320 申请日期 2002.10.24
申请人 VACUUM PROCESS TECHNOLOGY, INC.;CROCKER, RON, A. 发明人 CROCKER, RON, A.
分类号 B05B13/02;C23C14/50;H01L21/687;H05K3/00;(IPC1-7):B05C13/02 主分类号 B05B13/02
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