发明名称 |
Holder, system, and process for improving overlay in lithography |
摘要 |
A deformable holder, system, and process where long range errors (any of lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected. The long range errors are determined using either a through-the-lens alignment metrology system or an around-the-lens metrology system. Deformation values are determined to compensate for the longe range errors. The deformation values are determined by either solving simultaneous equations or by finite-element linear-stress-analysis (FEA). The mask or wafer is then distorted, in-plane, by an amount related to the determined deformation values using an actuator such an a piezoelectric ceramic to push or pull the mask or wafer to substantially realign the projected image of the mask and the existing pattern on the wafer.
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申请公布号 |
US2003081193(A1) |
申请公布日期 |
2003.05.01 |
申请号 |
US20020159268 |
申请日期 |
2002.06.03 |
申请人 |
WHITE DONALD L.;WOOD OBERT REEVES |
发明人 |
WHITE DONALD L.;WOOD OBERT REEVES |
分类号 |
G03F7/20;(IPC1-7):G03C5/00;G03B27/58;G03B27/32 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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